Titania
Some Logic and CIS processes require high aspect ratio etch at a high productivity. The Titania series supports the temperature control and uniformity required for etch performance in terms of profile and defect densities needed for these applications.
Temp. Range & Stability
-10℃ to 80℃
30℃ to 120℃
Value 1
Temperature Range & Stability
Flowrate Range & Stability
Dimensions
325 mm W x 845 mm L x 1500 mm H